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Sputtering pressure effects and temperature-dependent magnetism of Co/Pd multilayers

机译:Co / pd多层膜的溅射压力效应和温度依赖性磁性

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摘要

The temperature dependence of the sputtering Ar pressure effects on magnetic properties and the coercivity mechanism of Co(2 Å)/Pd(13 Å) multilayers were studied as the sputtering Ar pressure varied from 3–15 mTorr and the temperature from 300 to 35 K. It is found that the roughness of the interfaces or film surface increases with increasing sputtering pressure, the anisotropy increases with decreasing temperature and increasing Ar pressure and shows a maximum at PAr≃12 mTorr, and the coercivity increases with Ar pressure and shows stronger temperature dependence at higher Ar pressure. The coercivity mechanism was analyzed in terms of the coercivity predicted by Kronmüller\u27s theory [Phys. Status Solidi B 144, 385 (1987)]. Wall pinning is found to be the main mechanism and the size of the pinning site increases slightly as the Ar pressure increases. Journal of Applied Physics is copyrighted by The American Institute of Physics.
机译:研究了溅射Ar压力在3–15 mTorr和300至35 K的温度范围内时,溅射Ar压力对Co(2Å)/ Pd(13Å)多层膜的磁性能和矫顽力机理的温度依赖性。结果发现,界面或薄膜表面的粗糙度随溅射压力的增加而增加,各向异性随温度的降低和Ar压力的增加而增加,并在PAr≃12mTorr时表现出最大值,而矫顽力随Ar压力而增加并表现出更强的温度氩气压力较高时的依赖性。根据Kronmüller的理论[Phys。固态B 144,385(1987)]。发现壁钉扎是主要机理,并且随着Ar压力的增加,钉扎部位的大小略有增加。 《应用物理杂志》的版权归美国物理学会所有。

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